Aluminum dihydride complexes and their unexpected application in atomic layer deposition of titanium carbonitride films
نویسندگان
چکیده
منابع مشابه
Atomic Layer Deposition of Aluminum Oxide
I Acknowledgements II Dedication III List of Figures V
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Praseodymium aluminum oxide (PAO) thin films were grown by atomic layer deposition (ALD) from a new precursor, tris(N,N′-diisopropylacetamidinato) praseodymium, (Pr(amd)3), trimethylaluminum (TMA), and water. Smooth, amorphous films having varying compositions of the general formula PrxAl2–xO3 were deposited on HF-last silicon and analyzed for physical and electrical characteristics. The films ...
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چکیده ندارد.
15 صفحه اولAtomic layer deposition and properties of ZrO2/Fe2O3 thin films
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Dye-sensitized solar cells (DSSCs) utilize high surface area metal oxide sintered particle networks to absorb molecular dyes and transport injected charge carriers. While this sintered particle architecture allows liquid electrolyte DSSCs to achieve efficiencies up to 11%, slow charge transport through the semiconductor network limits the amount of modification that can be made to the electroly...
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ژورنال
عنوان ژورنال: Dalton Transactions
سال: 2018
ISSN: 1477-9226,1477-9234
DOI: 10.1039/c8dt02508h